D&E - Optical Proximity Correction Software Engineer - Hsinchu
Indexed description
- Develop algorithms for large-scale parallel lithography computational systems.
- Cooperate deeply with customer to develop and troubleshooting OPC recipes.
- Provide quick responses to customer’s urgent requests.
- Write programs (C/C++, LUA) for large-scale parallel lithography computational systems.
- Debug program under restricted environments, and bounded time.
- Educate and communicate with customer R&Ds.
- 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
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